NWS-POL · Process chemistry

Slurries, Compounds & Abrasives

Formulation-led polishing media matched to substrate, contact tool, delivery mode and target surface.
Slurries, Compounds & Abrasives

NEWWAYSMART · APPLICATION-SELECTED GRADES

Choose a classic grade. Customize the specification.

Compare representative material and formulation options by workpiece and process stage. All products are made to order, with sample and first-article support. Numerical values below are typical selection references; the final specification is agreed for your process.

23 representative grades · Select a model for technical details
Model / productWorkpiece & stageTypical selection parameters
NWS-POL-3101Fine Ceria Slurry for Blue GlassView grade →Blue-glass filters and soft optical glassFine polishing
Abrasive
Cerium oxide
D50
0.10–0.14 µm
D90
≤ 0.40 µm
Solids
4.5–5.5%
pH
8–9
NWS-POL-3102Concentrated Ceria Optical SlurryView grade →Optical glass and compatible glass substratesPolishing
Abrasive
Cerium oxide
D50
0.4–0.7 µm
D90
≤ 2.00 µm
Solids
38–45%
pH
8–9
NWS-POL-3201Acidic Ceria Slurry for Glass WafersView grade →Glass wafers and precision opticsFine polishing
Abrasive
Cerium oxide
Particle-size reference
0.1–0.2 µm
Solids
25%
pH
4.0
NWS-POL-3202Fine Ceria Slurry for Glass FinishingView grade →Glass wafers and optical glassFine polishing
Abrasive
Cerium oxide
Particle-size reference
0.05–0.1 µm
Solids
15%
pH
9.5
NWS-POL-3203Zirconia Slurry for Soft Optical GlassView grade →Soft optical glass, filters and camera lensesPolishing
Abrasive
Zirconium oxide
Particle-size reference
0.8–1.0 µm
Solids
25–30%
NWS-POL-3204Acidic Silica Slurry for AlN CeramicsView grade →Aluminum nitride ceramic substratesFine polishing
Abrasive
Silicon dioxide
Particle-size reference
60–80 nm
pH
3.0
NWS-POL-3301Sapphire Final-Polishing Silica SlurryView grade →Sapphire substrates and optical windowsPrecision polishing
Abrasive
Silicon dioxide
D50
100 ± 20 nm
Recommended contact material
Damping cloth
NWS-POL-3302Single-Sided Sapphire Alumina SlurryView grade →Sapphire substratesSingle-sided polishing
Abrasive
Aluminum oxide
D50
1.8 ± 0.1 µm
Recommended contact material
Synthetic fibre pad
NWS-POL-3303Double-Sided Sapphire Alumina SlurryView grade →Sapphire substratesDouble-sided polishing
Abrasive
Aluminum oxide
D50
1.4 ± 0.1 µm
Recommended contact material
Polyurethane pad
NWS-POL-5301Fine Diamond Slurry for SiC SubstratesView grade →Silicon carbide substratesFine grinding
Abrasive
Diamond
D50
2.4 ± 0.1 µm
Liquid base
Water based
Recommended contact material
Synthetic fibre pad
NWS-POL-3401Polycrystalline Diamond Slurry GradesView grade →SiC, hard ceramics and optical materialsLapping / polishing
Abrasive
Polycrystalline diamond
Nominal grade options
3 / 4 / 6 µm
Liquid-base options
Water based or oil based
NWS-POL-3402Fine Alumina Slurry for Compound SemiconductorsView grade →Compound-semiconductor workpiecesFine polishing
Abrasive
Aluminum oxide
Particle-size range
0.05–0.8 µm across grades
Formulation pH range
4–12 across grades
Concentration range
10–30% across grades
NWS-POL-3403Colloidal Silica Wafer-Polishing GradesView grade →Semiconductor wafers and compatible precision surfacesFine polishing
Abrasive
Colloidal silica
Particle-size options
80 / 100 / 120 nm
Solids range
15–45 wt% across grades
Formulation pH range
3–12 across grades
NWS-POL-3501Silica Slurry for Intermediate Silicon PolishingView grade →Silicon wafersIntermediate polishing
Abrasive
Colloidal silica
Particle-size reference
76.42 nm
Typical pH
10.58
NWS-POL-3502Silica Slurry for Final Silicon PolishingView grade →Silicon wafersFine polishing
Abrasive
Colloidal silica
Particle-size reference
66.72 nm
Typical pH
10.45
NWS-POL-5501Fine Silica Slurry for SiC WafersView grade →Silicon carbide wafersFine polishing
Abrasive
Colloidal silica
Particle-size reference
42.13 nm
Typical pH
9.76
NWS-POL-3601Ceria Slurry for Fibre Array UnitsView grade →FAU optical-communication componentsPolishing
Abrasive
Cerium oxide
Particle-size reference
0.104 µm
Typical pH
7.38
NWS-POL-3602Alumina Slurry for InP Pre-PolishingView grade →Indium phosphide workpiecesCoarse polishing
Abrasive
Aluminum oxide
Particle-size reference
0.561 µm
Typical pH
7.15
NWS-POL-3603Silica Slurry for InP Fine PolishingView grade →Indium phosphide workpiecesFine polishing
Abrasive
Colloidal silica
Particle-size reference
103.3 nm
Typical pH
10.49
NWS-POL-3604Silica Slurry for Lithium NiobateView grade →Lithium niobate optical and piezoelectric componentsPolishing
Abrasive
Colloidal silica
Particle-size reference
112.8 nm
Typical pH
9.96
NWS-POL-3605Silica Slurry for Resin OpticsView grade →Resin lenses and optical resin partsFine polishing
Abrasive
Colloidal silica
Particle-size reference
128.5 nm
Typical pH
4.16
NWS-POL-3701Silica Grades for POLY CMPView grade →Polysilicon filmsCMP
Abrasive
Colloidal silica
Typical D50
Approximately 50 nm
Typical solids
Approximately 15%
Typical pH
Approximately 11
NWS-POL-3702Ceria Grades for STI CMPView grade →Oxide / nitride isolation structuresCMP
Abrasive
Cerium oxide
Typical D50
85 nm
Typical solids
Approximately 1%
Typical pH
Approximately 4.6

Need a different size, hardness, particle distribution or chemistry? Send your current process and target. For slurries, particle size is only labelled D50 where that statistic is specified. Shore A and Shore D hardness values are different scales.

Explore custom materials, dimensions and supply options →

PRODUCT OPTIONS

Available constructions and formats.

  • Polishing liquids, compounds, pastes and powders
  • Diamond abrasive and other product options by request
  • Supply for wafer, optical and technical ceramic applications

CUSTOM SUPPLY

Made for the order.

  • Custom dimensions and configurations
  • Drawing, sample or requirement-based quotation
  • Sample and repeat-order support

APPLICATIONS

Where this product is supplied.

  • Wafer finishing
  • Optical polishing
  • Technical ceramic processing

APPLICATION & ORDER INFORMATION

Find products for your workpieces.

Can I order custom slurries, compounds & abrasives?

Custom dimensions and configurations are available. Send a drawing, sample photo or product requirement for an order-specific quotation.

What determines the price of this product?

Material, dimensions, configuration and order quantity affect the quotation. We do not publish a universal price for custom products. Request a quotation for your product →

Browse product and application buying guides →

PRODUCT TYPES

Choose the closest product type.

Final dimensions, material and configuration are confirmed for the order.
01 · Diamond slurryMonocrystalline Diamond SlurriesDiamond-slurry directions for controlled lapping and polishing where cutting action, suspension and surface target are matched.View product →02 · Diamond slurryPolycrystalline Diamond SlurriesPolycrystalline-diamond suspension directions for fine removal and surface refinement on compatible hard materials.View product →03 · Silica slurryColloidal Silica Polishing SlurriesChemistry-led silica-slurry directions for fine polishing of selected wafers, glass and ceramics.View product →04 · Alumina slurryAlumina Polishing SlurriesAlumina-abrasive slurry directions for selected metal, ceramic and substrate finishing steps.View product →05 · Ceria slurryCeria Glass-Polishing SlurriesCeria-based polishing directions for compatible optical and glass surfaces.View product →06 · Compound / pasteDiamond Compounds & PastesConcentrated diamond media for controlled manual, fixture-based or machine-assisted finishing routes.View product →07 · Loose abrasiveLoose Abrasive PowdersAlumina, silicon-carbide and other loose-abrasive directions for controlled lapping formulations.View product →08 · Application-coded slurryNWS-POL-3000 Glass-Wafer Polishing SlurryA glass-wafer fine-polishing formulation route whose released specification is tied to the glass, pad, machine, process window and approved validation method.View product →09 · Application-coded slurryNWS-POL-5000 SiC-Wafer Polishing SlurryA 4H/6H silicon-carbide wafer polishing formulation route controlled by wafer face, incoming condition, pad, machine and approved metrology.View product →

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