NWS-POL-5301 · Slurries, Compounds & Abrasives

NWS-POL-5301 Fine Diamond Slurry for SiC Substrates

Fine Diamond Slurry for SiC Substrates for silicon carbide substrates. Fine grinding. Abrasive: Diamond; D50: 2.4 ± 0.1 µm. Custom-made for the agreed process.
Slurries, Compounds & Abrasives family reference; not the exact NWS-POL-5301 Fine Diamond Slurry for SiC Substrates configuration
Product-family reference. Final geometry and material are confirmed for the order.

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