NWS-PAD-2202 · PU Polishing Pads

NWS-PAD-2202 Microporous Damping-Cloth Finishing Pads

Microporous Damping-Cloth Finishing Pads for wafers, optical components, glass and metal. Fine polishing. Thickness options: 0.5 / 0.6 / 0.8 / 1.0 / 1.4 / 1.5 mm; Density range: 0.34–0.66 g/cm³. Custom-made for the agreed process.
PU Polishing Pads family reference; not the exact NWS-PAD-2202 Microporous Damping-Cloth Finishing Pads configuration
Product-family reference. Final geometry and material are confirmed for the order.

RELATED TYPES IN PU POLISHING PADS

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PU padPolyurethane Polishing PadsHardness, pore structure and groove directions selected around contact stability, slurry transport and target finish.Soft polishing clothSilk Polishing ClothsSoft contact-cloth directions for selected fine-polishing and final-surface applications.Napped clothSynthetic Velvet Polishing ClothsNapped polishing-cloth directions for applications needing compliant contact and controlled liquid retention.Coated abrasiveDiamond Lapping & Polishing FilmsPrecision coated-abrasive films selected by backing, diamond type, grade and format for controlled fine finishing.

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