NWS-PAD-2201 · PU Polishing Pads

NWS-PAD-2201 Nonwoven Substrate Lapping Pads

Nonwoven Substrate Lapping Pads for sic, sapphire, microcrystalline glass and ceramics. Coarse / intermediate polishing. Thickness options: 0.8 / 1.0 / 1.2 / 1.27 / 1.3 / 1.5 / 2.0 / 3.0 mm; Density range: 0.43–0.55 g/cm³. Custom-made for the agreed process.
PU Polishing Pads family reference; not the exact NWS-PAD-2201 Nonwoven Substrate Lapping Pads configuration
Product-family reference. Geometry and materials are defined for the order.

HOW THIS PRODUCT IS JUDGED

Connect the physical product to its process function.

Select one specific thickness, hardness and groove combination; listed options are not a single universal grade.

PRODUCT IDENTITY & CONFIGURATION

NWS-PAD-2201

NewwaySmart application-selected grade · Made to order · Sample and first-article supportTypical selection data, not a universal performance guarantee. Ranges represent grade options; not every combination is available. Final dimensions or formulation and batch acceptance are agreed for the order.
SiC, sapphire, microcrystalline glass and ceramicsCoarse / intermediate polishing
Thickness optionsreference
0.8 / 1.0 / 1.2 / 1.27 / 1.3 / 1.5 / 2.0 / 3.0 mm
Density rangereference
0.43–0.55 g/cm³
Hardness optionsreference
Shore A 55 / 65 / 75 / 80 / 85 / 92 / 95
Diameter optionsreference
150–1500 mm across listed sizes
  1. 01Confirm the workpiece and process stage.
  2. 02Select the pad, plate, carrier and chemistry as a matched system.
  3. 03Agree the sample specification and acceptance method.
  4. 04Release the order specification after the agreed application trial.

SELECTION FOCUS

Questions that change the direction.

  • SiC, sapphire, microcrystalline glass and ceramics
  • Coarse / intermediate polishing
  • Select one specific thickness, hardness and groove combination; listed options are not a single universal grade.

RFQ & DRAWING FIELDS

Evidence needed before release.

  • Workpiece material, dimensions and incoming surface
  • Machine, pad or plate, pressure, speed and liquid delivery
  • Required finish, removal allowance and inspection method
  • Quantity, sample requirement and final specification

ORDER CONFIGURATION

Made for your process.

Select the grade, custom dimensions or formulation, packaging and sample quantity. The family image illustrates the product type; the order specification defines the supplied product.Do not submit confidential customer drawings until a secure project channel is confirmed.

PUBLIC CLAIM BOUNDARY

Typical direction is not a performance guarantee.

Dimensions, materials, removal rate, roughness, life and compatibility are published only when supported by an approved drawing, material record or project-specific validation. Unverified label examples, third-party photographs and customer pricing remain internal references.

RELATED TYPES IN PU POLISHING PADS

Compare neighbouring constructions.

PU padPolyurethane Polishing PadsHardness, pore structure and groove directions selected around contact stability, slurry transport and target finish.Soft polishing clothSilk Polishing ClothsSoft contact-cloth directions for selected fine-polishing and final-surface applications.Napped clothSynthetic Velvet Polishing ClothsNapped polishing-cloth directions for applications needing compliant contact and controlled liquid retention.Coated abrasiveDiamond Lapping & Polishing FilmsPrecision coated-abrasive films selected by backing, diamond type, grade and format for controlled fine finishing.

DRAWING · SAMPLE · PROCESS EVIDENCE

Start with what is known. Keep assumptions visible.

Prepare the first review →